Diffusion in Silicon : A Seven-Year Retrospective.

By: Fisher, David JMaterial type: TextTextSeries: Defect and Diffusion ForumPublisher: Durnten : Trans Tech Publications, Limited, 2005Copyright date: ©2005Edition: 1st edDescription: 1 online resource (210 pages)Content type: text Media type: computer Carrier type: online resourceISBN: 9783038130314Subject(s): Diffusion | Silicon -- Analysis | SiliconGenre/Form: Electronic books.Additional physical formats: Print version:: Diffusion in Silicon : A Seven-Year RetrospectiveDDC classification: 620.193 LOC classification: QD181.S6.D54 2005ebOnline resources: Click to View
Contents:
Intro -- Diffusion in Silicon - A Seven-Year Retrospective -- Table of Contents -- Abstracts.
Summary: This collection of abstracts of experimental and theoretical papers on the subject of diffusion in silicon is intended to complement earlier volumes (DDF153-155) which covered the previous decade's work on the same topic.The abstracts are grouped according to the diffusing species in question. The latter comprise Ag, Al, As, Au, B, Ba, Be, C, Ca, Cl, Co, Cr, Cu, Er, F, Fe, Ge, H, He, Hf, In, Ir, K, Mg, Mn, Mo, N, Na, Nb, Ni, O, P, Pb, Pt, Rb, Sb, Se, Si, SiH3, Sn, Ti, V, Yb and Zn with regard to bulk diffusion, Ag, Au, Ba, Cl, Cu, Er, F, Ga, Ge, In, O, Pb, Sb, Si, SiH3, Sn and Y with regard to surface diffusion, H with regard to grain-boundary diffusion, and self-diffusion in liquid Si.In a separate section, diffusion in SiGe alloys is covered. The work on bulk diffusion here involves the diffusants: As, Au, B, Cu, Ge, H, Li, P, Sb or Si.Overall, this succinct up-to-date guide to the topic of diffusion in silicon will be useful to anyone involved in the theory, development or processing of silicon-based semiconductors.
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Intro -- Diffusion in Silicon - A Seven-Year Retrospective -- Table of Contents -- Abstracts.

This collection of abstracts of experimental and theoretical papers on the subject of diffusion in silicon is intended to complement earlier volumes (DDF153-155) which covered the previous decade's work on the same topic.The abstracts are grouped according to the diffusing species in question. The latter comprise Ag, Al, As, Au, B, Ba, Be, C, Ca, Cl, Co, Cr, Cu, Er, F, Fe, Ge, H, He, Hf, In, Ir, K, Mg, Mn, Mo, N, Na, Nb, Ni, O, P, Pb, Pt, Rb, Sb, Se, Si, SiH3, Sn, Ti, V, Yb and Zn with regard to bulk diffusion, Ag, Au, Ba, Cl, Cu, Er, F, Ga, Ge, In, O, Pb, Sb, Si, SiH3, Sn and Y with regard to surface diffusion, H with regard to grain-boundary diffusion, and self-diffusion in liquid Si.In a separate section, diffusion in SiGe alloys is covered. The work on bulk diffusion here involves the diffusants: As, Au, B, Cu, Ge, H, Li, P, Sb or Si.Overall, this succinct up-to-date guide to the topic of diffusion in silicon will be useful to anyone involved in the theory, development or processing of silicon-based semiconductors.

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Electronic reproduction. Ann Arbor, Michigan : ProQuest Ebook Central, 2018. Available via World Wide Web. Access may be limited to ProQuest Ebook Central affiliated libraries.

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