000			02889nam a22004693i 4500
001			EBC1867695
003			MiAaPQ
005			20181121174531.0
006			m o d |
007			cr cnu||||||||
008			181113s2005 xx o ||||0 eng d
020			_a9783038130314 _q(electronic bk.)
020			_z9783908451112
035			_a(MiAaPQ)EBC1867695
035			_a(Au-PeEL)EBL1867695
035			_a(CaPaEBR)ebr10777887
035			_a(OCoLC)607839769
040			_aMiAaPQ _beng _erda _epn _cMiAaPQ _dMiAaPQ
050		4	_aQD181.S6.D54 2005eb
082	0		_a620.193
100	1		_aFisher, David J.
245	1	0	_aDiffusion in Silicon : _bA Seven-Year Retrospective.
250			_a1st ed.
264		1	_aDurnten : _bTrans Tech Publications, Limited, _c2005.
264		4	_c©2005.
300			_a1 online resource (210 pages)
336			_atext _btxt _2rdacontent
337			_acomputer _bc _2rdamedia
338			_aonline resource _bcr _2rdacarrier
490	1		_aDefect and Diffusion Forum ; _vv.241
505	0		_aIntro -- Diffusion in Silicon - A Seven-Year Retrospective -- Table of Contents -- Abstracts.
520			_aThis collection of abstracts of experimental and theoretical papers on the subject of diffusion in silicon is intended to complement earlier volumes (DDF153-155) which covered the previous decade's work on the same topic.The abstracts are grouped according to the diffusing species in question. The latter comprise Ag, Al, As, Au, B, Ba, Be, C, Ca, Cl, Co, Cr, Cu, Er, F, Fe, Ge, H, He, Hf, In, Ir, K, Mg, Mn, Mo, N, Na, Nb, Ni, O, P, Pb, Pt, Rb, Sb, Se, Si, SiH3, Sn, Ti, V, Yb and Zn with regard to bulk diffusion, Ag, Au, Ba, Cl, Cu, Er, F, Ga, Ge, In, O, Pb, Sb, Si, SiH3, Sn and Y with regard to surface diffusion, H with regard to grain-boundary diffusion, and self-diffusion in liquid Si.In a separate section, diffusion in SiGe alloys is covered. The work on bulk diffusion here involves the diffusants: As, Au, B, Cu, Ge, H, Li, P, Sb or Si.Overall, this succinct up-to-date guide to the topic of diffusion in silicon will be useful to anyone involved in the theory, development or processing of silicon-based semiconductors.
588			_aDescription based on publisher supplied metadata and other sources.
590			_aElectronic reproduction. Ann Arbor, Michigan : ProQuest Ebook Central, 2018. Available via World Wide Web. Access may be limited to ProQuest Ebook Central affiliated libraries.
650		0	_aDiffusion.
650		0	_aSilicon -- Analysis.
650		0	_aSilicon.
655		4	_aElectronic books.
776	0	8	_iPrint version: _aFisher, David J. _tDiffusion in Silicon : A Seven-Year Retrospective _dDurnten : Trans Tech Publications, Limited,c2005 _z9783908451112
797	2		_aProQuest (Firm)
830		0	_aDefect and Diffusion Forum
856	4	0	_uhttps://ebookcentral.proquest.com/lib/buse-ebooks/detail.action?docID=1867695 _zClick to View
999			_c127322 _d127322